네! 진행합니다. 사양 회신 부탁드립니다. sales@g-materials.com Silicon Nitride Wafers Si3N4 we offers a variety of film processing options for your silicon needs. This includes LPCVD nitride, and we can provide wafers with stoichiometric LPCVD nitride or low stress LPCVD nitride, as well as super low stress LPCVD nitride. We also offer high quality PECVD nitride, Low stress PECVD nitride, and PECVD Oxy Nitride. Wafer diameter is available from 2″ to 300mm and nitride thickness is available from 100Å to 20,000Å.
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SiO2 wafer 문의